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Etching solution Product List and Ranking from 8 Manufacturers, Suppliers and Companies

Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.

Etching solution Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.

  1. KANTO CHEMICAL CO., INC. Electronics Material Division Tokyo//Chemical
  2. Hayashi Pure Chemical Ind., Ltd. Electronic Materials Osaka//Chemical
  3. null/null
  4. 4 奥野製薬工業 大阪・放出、東京、名古屋など Osaka//Chemical
  5. 5 サンハヤト Tokyo//Resin/Plastic
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Etching solution Product ranking

Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.

  1. Aluminum etching solution "MIXED ACID Al Etchant" KANTO CHEMICAL CO., INC. Electronics Material Division
  2. Titanium Etchant "TI Series" KANTO CHEMICAL CO., INC. Electronics Material Division
  3. Gold Etchant "AURUM Series" KANTO CHEMICAL CO., INC. Electronics Material Division
  4. SUS Roughening Etching Solution "PureEtch MF series" Hayashi Pure Chemical Ind., Ltd. Electronic Materials
  5. 4 Cu etching solution "Pure Etch C series" Hayashi Pure Chemical Ind., Ltd. Electronic Materials

Etching solution Product List

1～15 item / All 49 items

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Etchant for amorphous transparent conductive films 'ITO-07N'

Etchant for amorphous transparent conductive films 'ITO-07N'

Residue-free ITO etchant compatible with various underlying films such as SiO₂ and SiNx!

“ITO-07N” is a transparent conductive thin-film etchant that enables high-precision patterning of amorphous ITO, IZO, and other materials in FPD manufacturing processes. 【Features】 ■ Optimal for patterning amorphous ITO, IZO, etc. ■ Minimal side etching, allowing for high-precision patterning ■ Low foaming properties and excellent defoaming performance *Please feel free to contact us.

  • Surface treatment contract service

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Silver etchant 'SEA Series'

Silver etchant 'SEA Series'

A silver alloy etching solution with high residue removal capability and minimal side etching, enabling precise processing!

The "SEA Series" is an etching solution for fine processing of Ag thin films suitable for the reflection electrodes and wiring formation processes of LCDs and OLEDs. 【Features】 ■ Enables micro-order fine patterning due to low etching rates ■ Good etching shape ■ Selectivity with poly ITO base films ■ Applicable for paddle and spray etching methods *For more details, please feel free to contact us.

  • Chemicals

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Multilayer film etchant "KSMF Series"

Multilayer film etchant "KSMF Series"

Wet etchant for Al multilayer films, enabling precise etching of Ti/Al/Ti stacks.

It is an etching solution that can process Al multilayer films in a single liquid. It can also be applied to Ti/Al/Ti multilayer films, which have been difficult to wet etch until now. 【Features】 ■ Capable of etching Ti/Al/Ti multilayer films and Mo/Al/Mo multilayer films all at once ■ KSMF-100 can also be used as a low-taper etching solution for Mo single films and Al single films, in addition to Mo/Al/Mo multilayer films ■ KSMF-260 enables taper etching of Ti/Al/Ti multilayer films *For more details, please feel free to contact us.

  • Surface treatment contract service

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Titanium Etchant "TI Series"

Titanium Etchant "TI Series"

High-performance titanium etchant offering excellent selectivity with various metals.

In the removal of barrier layers and adhesion layers of Cu and Au electrodes, selective etching of Ti is possible. 【Features】 ■ TI-8A allows selective etching with various metals and can also be used as an etching solution for TiN and TiW. ■ TI-101 enables selective etching with Cu and Ag without using hydrogen peroxide. *For more details, please feel free to contact us.

  • Surface treatment contract service

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Ruthenium etching solution "REC Series"

Ruthenium etching solution "REC Series"

Etching solution for ruthenium used as a material for semiconductor devices and photomasks.

This is an etching solution suitable for Ru films used in DRAM capacitor electrodes and photomasks. 【Features】 ■ REC-01 can etch Ru films in a short time and is capable of etching RuO2 as well. ■ REC-11 can suppress the generation of RuO4 gas, resulting in less metal contamination on wafers. ■ REC-11 is suitable for etching Ru thin films several nm thick. *For more details, please feel free to contact us.

  • Surface treatment contract service

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Al Damage-Free Si Etching Solution (Anisotropic)

Al Damage-Free Si Etching Solution (Anisotropic)

Al and Al alloy films are anisotropically etched well without corrosion.

The features of this product are as follows: - It enables the formation of a smooth etching surface. - Etching can be performed regardless of the metal opening ratio on the device surface. - There is minimal degradation of the etching solution. - It is recommended to use Pure Etch ZE series (Al damage-free insulating film etching solution) as a pretreatment solution. Keywords: wet etching, silicon anisotropic etching

  • Chemicals

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Al taper control etching solution

Al taper control etching solution

Etch the Al or Al alloy film at the desired taper angle.

The features of this product are as follows: - It forms the desired taper shape (taper angle). - It etches Al and Al alloy films effectively. - The etching speed and the in-plane uniformity of the etching shape are good. Keywords: wet etching, aluminum

  • Chemicals

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AlGaInP roughening etching solution

AlGaInP roughening etching solution

The surface of the AlGaInP film can be effectively roughened through etching, which improves the light extraction efficiency.

The features of this product are as follows: - It is possible to form desired unevenness and improve light extraction efficiency. - Processing can be done at low temperatures and in a short time. - The in-plane uniformity of the uneven shape is good. Keywords: frost treatment, unevenness, LED, light-emitting diode, aluminum indium gallium phosphide.

  • Other semiconductor manufacturing equipment

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Ag nanowire etching solution

Ag nanowire etching solution

We provide excellent etching of Ag nanowire films, available for both full etching and partial etching.

The features of this product are as follows: - It allows for processing at low temperatures and in a short time. - By adjusting the composition and processing conditions, full etching is also possible. Keywords: wet etching, silver nanowires, AgNW, SNW

  • Chemicals

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Ag・Ag alloy・Ag-based laminated film etching solution

Ag・Ag alloy・Ag-based laminated film etching solution

This etching solution is ideal for etching single-layer films of silver alloys such as Ag single films, APC (Ag-Pd-Cu alloy) films, or laminated films of Ag/transparent conductive films.

The features of this product are as follows: - The etching rate is stable. - There is minimal side etching, allowing for the formation of fine patterns. - The in-plane uniformity of etching speed and etching shape is excellent. Keywords: wet etching, silver, APC

  • Chemicals

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Cu etching solution "Pure Etch C series"

Cu etching solution "Pure Etch C series"

We etch Cu and Cu alloy films effectively. We offer solutions for standard thin film etching and bulk etching of Cu/Ti stacked films.

The features of this product are as follows: - It forms a good positive taper. - There is minimal side etching, allowing for the formation of fine patterns. - The etching speed and in-plane uniformity of the etching shape are excellent. Keywords: wet etching, copper

  • Chemicals

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Ti etching solution standard, Ti seed layer etching solution

Ti etching solution standard, Ti seed layer etching solution

We will etch the Ti film effectively. We have options for standard thin film etching and Ti seed layer etching.

The features of this product are as follows: - It has minimal side etching, allowing for the formation of fine patterns. - The etching speed and in-plane uniformity of the etching shape are excellent. - It is suitable for laminated films such as Cu/Ti and W/Ti. Keywords: wet etching, titanium

  • Chemicals

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