We have compiled a list of manufacturers, distributors, product information, reference prices, and rankings for Etching solution.
ipros is IPROS GMS ・ IPROS One of the largest technical database sites in Japan that collects information on.

Etching solution Product List and Ranking from 8 Manufacturers, Suppliers and Companies | IPROS GMS

Last Updated： Aggregation Period:Feb 11, 2026～Mar 10, 2026
This ranking is based on the number of page views on our site.

Etching solution Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Feb 11, 2026～Mar 10, 2026
This ranking is based on the number of page views on our site.

  1. KANTO CHEMICAL CO., INC. Electronics Material Division Tokyo//Chemical
  2. Hayashi Pure Chemical Ind., Ltd. Electronic Materials Osaka//Chemical
  3. null/null
  4. 4 サンハヤト Tokyo//Resin/Plastic
  5. 5 日研化学研究所 Aichi//Printing Industry
Go to Company Ranking

Etching solution Product ranking

Last Updated： Aggregation Period:Feb 11, 2026～Mar 10, 2026
This ranking is based on the number of page views on our site.

  1. Aluminum etching solution "MIXED ACID Al Etchant" KANTO CHEMICAL CO., INC. Electronics Material Division
  2. Titanium Etchant "TI Series" KANTO CHEMICAL CO., INC. Electronics Material Division
  3. Gold Etchant "AURUM Series" KANTO CHEMICAL CO., INC. Electronics Material Division
  4. 4 Chromium etchant "Cr Series" KANTO CHEMICAL CO., INC. Electronics Material Division
  5. 5 TiW Etching Solution "Pure Etch TE Series" Hayashi Pure Chemical Ind., Ltd. Electronic Materials

Etching solution Product List

1～30 item / All 50 items

Displayed results
Etchant for amorphous transparent conductive films 'ITO-07N'

Etchant for amorphous transparent conductive films 'ITO-07N'

Residue-free ITO etchant compatible with various underlying films such as SiO₂ and SiNx!

“ITO-07N” is a transparent conductive thin-film etchant that enables high-precision patterning of amorphous ITO, IZO, and other materials in FPD manufacturing processes. 【Features】 ■ Optimal for patterning amorphous ITO, IZO, etc. ■ Minimal side etching, allowing for high-precision patterning ■ Low foaming properties and excellent defoaming performance *Please feel free to contact us.

  • Surface treatment contract service
  • Etching solution

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Silver etchant 'SEA Series'

Silver etchant 'SEA Series'

A silver alloy etching solution with high residue removal capability and minimal side etching, enabling precise processing!

The "SEA Series" is an etching solution for fine processing of Ag thin films suitable for the reflection electrodes and wiring formation processes of LCDs and OLEDs. 【Features】 ■ Enables micro-order fine patterning due to low etching rates ■ Good etching shape ■ Selectivity with poly ITO base films ■ Applicable for paddle and spray etching methods *For more details, please feel free to contact us.

  • Chemicals
  • Etching solution

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Multilayer film etchant "KSMF Series"

Multilayer film etchant "KSMF Series"

Wet etchant for Al multilayer films, enabling precise etching of Ti/Al/Ti stacks.

It is an etching solution that can process Al multilayer films in a single liquid. It can also be applied to Ti/Al/Ti multilayer films, which have been difficult to wet etch until now. 【Features】 ■ Capable of etching Ti/Al/Ti multilayer films and Mo/Al/Mo multilayer films all at once ■ KSMF-100 can also be used as a low-taper etching solution for Mo single films and Al single films, in addition to Mo/Al/Mo multilayer films ■ KSMF-260 enables taper etching of Ti/Al/Ti multilayer films *For more details, please feel free to contact us.

  • Surface treatment contract service
  • Etching solution

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Titanium Etchant "TI Series"

Titanium Etchant "TI Series"

High-performance titanium etchant offering excellent selectivity with various metals.

In the removal of barrier layers and adhesion layers of Cu and Au electrodes, selective etching of Ti is possible. 【Features】 ■ TI-8A allows selective etching with various metals and can also be used as an etching solution for TiN and TiW. ■ TI-101 enables selective etching with Cu and Ag without using hydrogen peroxide. *For more details, please feel free to contact us.

  • Surface treatment contract service
  • Etching solution

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Ruthenium etching solution "REC Series"

Ruthenium etching solution "REC Series"

Etching solution for ruthenium used as a material for semiconductor devices and photomasks.

This is an etching solution suitable for Ru films used in DRAM capacitor electrodes and photomasks. 【Features】 ■ REC-01 can etch Ru films in a short time and is capable of etching RuO2 as well. ■ REC-11 can suppress the generation of RuO4 gas, resulting in less metal contamination on wafers. ■ REC-11 is suitable for etching Ru thin films several nm thick. *For more details, please feel free to contact us.

  • Surface treatment contract service
  • Etching solution

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Etching solution for printed circuit boards

Etching solution for printed circuit boards

Easily etch your own circuit boards.

This is an introduction to the etching solution handled by Sanhayato Corporation.

  • others
  • Etching solution

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Al Damage-Free Si Etching Solution (Anisotropic)

Al Damage-Free Si Etching Solution (Anisotropic)

Al and Al alloy films are anisotropically etched well without corrosion.

The features of this product are as follows: - It enables the formation of a smooth etching surface. - Etching can be performed regardless of the metal opening ratio on the device surface. - There is minimal degradation of the etching solution. - It is recommended to use Pure Etch ZE series (Al damage-free insulating film etching solution) as a pretreatment solution. Keywords: wet etching, silicon anisotropic etching

  • Chemicals
  • Etching solution

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Al taper control etching solution

Al taper control etching solution

Etch the Al or Al alloy film at the desired taper angle.

The features of this product are as follows: - It forms the desired taper shape (taper angle). - It etches Al and Al alloy films effectively. - The etching speed and the in-plane uniformity of the etching shape are good. Keywords: wet etching, aluminum

  • Chemicals
  • Etching solution

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
AlGaInP roughening etching solution

AlGaInP roughening etching solution

The surface of the AlGaInP film can be effectively roughened through etching, which improves the light extraction efficiency.

The features of this product are as follows: - It is possible to form desired unevenness and improve light extraction efficiency. - Processing can be done at low temperatures and in a short time. - The in-plane uniformity of the uneven shape is good. Keywords: frost treatment, unevenness, LED, light-emitting diode, aluminum indium gallium phosphide.

  • Other semiconductor manufacturing equipment
  • Etching solution

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Ag nanowire etching solution

Ag nanowire etching solution

We provide excellent etching of Ag nanowire films, available for both full etching and partial etching.

The features of this product are as follows: - It allows for processing at low temperatures and in a short time. - By adjusting the composition and processing conditions, full etching is also possible. Keywords: wet etching, silver nanowires, AgNW, SNW

  • Chemicals
  • Etching solution

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Ag・Ag alloy・Ag-based laminated film etching solution

Ag・Ag alloy・Ag-based laminated film etching solution

This etching solution is ideal for etching single-layer films of silver alloys such as Ag single films, APC (Ag-Pd-Cu alloy) films, or laminated films of Ag/transparent conductive films.

The features of this product are as follows: - The etching rate is stable. - There is minimal side etching, allowing for the formation of fine patterns. - The in-plane uniformity of etching speed and etching shape is excellent. Keywords: wet etching, silver, APC

  • Chemicals
  • Etching solution

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Cu etching solution "Pure Etch C series"

Cu etching solution "Pure Etch C series"

We etch Cu and Cu alloy films effectively. We offer solutions for standard thin film etching and bulk etching of Cu/Ti stacked films.

The features of this product are as follows: - It forms a good positive taper. - There is minimal side etching, allowing for the formation of fine patterns. - The etching speed and in-plane uniformity of the etching shape are excellent. Keywords: wet etching, copper

  • Chemicals
  • Etching solution

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Ti etching solution standard, Ti seed layer etching solution

Ti etching solution standard, Ti seed layer etching solution

We will etch the Ti film effectively. We have options for standard thin film etching and Ti seed layer etching.

The features of this product are as follows: - It has minimal side etching, allowing for the formation of fine patterns. - The etching speed and in-plane uniformity of the etching shape are excellent. - It is suitable for laminated films such as Cu/Ti and W/Ti. Keywords: wet etching, titanium

  • Chemicals
  • Etching solution

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Cr Etching Solution "Pure Etch CR series"

Cr Etching Solution "Pure Etch CR series"

We will etch the Cr film well. If you are considering the formation of fine patterns, we also offer suggestions for pretreatment solutions to improve wettability.

The features of this product are as follows: - It has minimal side etching, allowing for the formation of fine patterns. - The etching speed and in-plane uniformity of the etching shape are excellent. - It is suitable for etching of black matrix (BM) and photo masks made of chromium. Keywords: wet etching, chromium

  • Chemicals
  • Etching solution

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
ITO etching solution "Clean Etch ITO series"

ITO etching solution "Clean Etch ITO series"

We provide excellent etching for ITO films, with options available for both a-ITO etching and p-ITO etching.

The features of this product are as follows: - There are no residues after etching. - It has low foaming properties and excellent defoaming capabilities. - The etching speed and the in-plane uniformity of the etching shape are good. Keywords: wet etching, indium tin oxide

  • Chemicals
  • Etching solution

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Ni Etching Solution "Pure Etch NE series"

Ni Etching Solution "Pure Etch NE series"

It etches the Ni film well.

The features of this product are as follows: - There is little side etching, allowing for the formation of fine patterns. - The etching speed and the in-plane uniformity of the etching shape are excellent. Keywords: Wet etching, nickel For roughening etching solution that processes the surface shape of Ni into a rough texture, please refer to the "Ni Roughening Etching Solution" page.

  • Chemicals
  • Etching solution

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Single crystal silicon texture etching solution

Single crystal silicon texture etching solution

We will form a texture on the single crystal silicon substrate (possible size: 2 to 3 μm).

The features of this product are as follows: - It is a one-component type that is used by adding to an alkaline solution. - It can form a TEX size of 2-3μm. - It requires a small amount of chemical solution and has a long chemical life. - It enables improvement in conversion efficiency due to the reduction of surface reflectivity after treatment. Keywords: texture formation, unevenness, single crystal Si, solar cells.

  • Chemicals
  • Etching solution

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Crystal etching liquid "Pure Etch ZE series"

Crystal etching liquid "Pure Etch ZE series"

We etch the quartz with a flatter bottom shape than conventional products without corroding the mask made of resist or metal films (such as Au and Cr).

The features of this product are as follows: - The angle difference of the taper angle in the cross-sectional shape can be reduced compared to conventional products. - The etched bottom surface can be etched more flatly than conventional products. - The uniformity of thickness is excellent. Keywords: wet etching, quartz

  • Chemicals
  • Chemicals
  • Etching solution

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Roughening etching solution

Roughening etching solution

Reduction of reflectivity, improvement of efficiency, enhancement of adhesion, roughening of silicon, compound semiconductors, and metal surfaces.

- It forms the desired unevenness. - The in-plane uniformity of the uneven shape is good.

  • スクリーンショット 2021-06-01 173458.png
  • Chemicals
  • Etching solution

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Cu seed layer etching solution

Cu seed layer etching solution

For the Cu plating/Cu seed structure, it etches the Cu seed layer with minimal damage to the Cu plating wiring and bumps.

The features of this product are as follows: - There is less thinning of the Cu plating. - There is less surface roughness of the Cu. - It can be applied to various seed layers (from electroless copper plating to sputtered copper). - It supports various methods such as dip, spray, and spin. Keywords: wet etching, copper, plating, seed layer, selective semi-additive method.

  • Chemicals
  • Etching solution

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Ni rough surface etching solution "Pure Etch MF series"

Ni rough surface etching solution "Pure Etch MF series"

The surface of Ni is well roughened and etched without using any special techniques.

The features of this product are as follows: - It forms the desired unevenness. - The uniformity of the uneven surface shape is good. Keywords: chemical roughening, unevenness, nickel, plating, sputtering.

  • Chemicals
  • Etching solution

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
InP roughening etching solution

InP roughening etching solution

The surface of the InP film can be effectively roughened through etching, which can improve the light extraction efficiency.

The features of this product are as follows: - It is possible to form desired unevenness and improve light extraction efficiency. - Processing can be done at low temperatures and in a short time. - The in-plane uniformity of the uneven surface shape is excellent. Keywords: frost treatment, unevenness, LED, light-emitting diode, indium phosphide.

  • Chemicals
  • Etching solution

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Aluminum etching solution "MIXED ACID Al Etchant"

Aluminum etching solution "MIXED ACID Al Etchant"

Etching solution for Al that enables fine processing!

The "MIXED ACID Al Etchant" is an etching solution for aluminum that allows for fine processing without damaging glass or silicon substrates. It can also be used as an etching solution for molybdenum and molybdenum alloys. 【Features】 ■ No dilution or mixing required; can be used as is ■ No damage to glass, silicon substrates, etc. ■ Good in-plane uniformity of etching shapes ■ No etching residues ■ Al etching rate of approximately 1,000 Å/min (30°C)

  • Surface treatment contract service
  • Etching solution

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Gold Etchant "AURUM Series"

Gold Etchant "AURUM Series"

A gold etchant for high-precision patterning with minimal residue. Delivers excellent profiles in fine bump and wiring formation.

The "AURUM Series" is an etching solution for Au thin films that offers excellent wettability and achieves superior processing shapes in high-resolution bump and wiring formation processes, with a long liquid life. 【Features】 - Minimal etching residue, enabling high-resolution patterning - Free of cyan compounds, with excellent surface smoothness - Long liquid life, allowing for cost reduction - Excellent selectivity against dissimilar metals such as Al, Ni, Cr, and Ti - Does not damage substrates like Si and glass We offer high etching rate products for high resolution... AURUM-304: approximately 300nm/min (30℃) Low etching rate products for high resolution... AURUM-302: approximately 100nm/min (30℃) *For more details, please feel free to contact us.

  • Chemicals
  • Etching solution

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Etchant for polycrystalline transparent conductive films "ITO Series"

Etchant for polycrystalline transparent conductive films "ITO Series"

Low-resistance polycrystalline ITO film etchant – Cu damage suppression depending on model number

"Mixed Acid ITO-02" is an etching solution that enables high-precision patterning of low-resistance poly-ITO electrodes in the FPD manufacturing process. Additionally, "ITO-301" is an etching solution that suppresses Cu damage and allows for the patterned formation of low-resistance poly-ITO electrodes. 【Features】 ■ Usable for etching low-resistance poly-ITO films ■ Capable of etching poly-ITO films and amorphous ITO films at low temperatures and in a short time ■ No damage to glass substrates ■ Cu damage can be suppressed depending on the model number ■ No dilution or formulation is required; it can be used as is

  • Surface treatment contract service
  • Etching solution

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Copper etching solution "GHP-3" "BTF-3"

Copper etching solution "GHP-3" "BTF-3"

Smooth finish, minimal change in Cu surface roughness.

It is suitable for etching Cu/Ti seed layers after Cu plating, and it is also possible to etch Cu and Ti simultaneously. Additionally, it has a minimal impact on transmission loss as it does not compromise the smoothness of the Cu surface. 【Features】 ■ The smoothness before etching is not compromised ■ Minimal shape change due to over-etching *For more details, please feel free to contact us.

  • Surface treatment contract service
  • Etching solution

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Chromium etchant "Cr Series"

Chromium etchant "Cr Series"

Chromium etchant with minimal side etching during patterning.

Etchant suitable for electrode materials such as crystal oscillators and MEMS sensors, as well as for Cr thin films used in photomasks. 【Features】 ■ Enables patterning with minimal side etching ■ Cr-301 is suitable for adjusting the thickness of Cr films due to its extremely low etching rate. *For more details, please feel free to contact us.

  • Surface treatment contract service
  • Etching solution

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
COPYRIGHT © 2001-2026 IPROS CORPORATION ALL RIGHTS RESERVED.